p27-34 EAS IC Awards 2008 yield management 2/7/08 09:56 Page 30
30 IC INDUSTRY AWARDS PREVIEW
non visual destructive analytical methods, making it
As IC manufacturers integrate more
residue suited for inline process monitoring.
new materials and processes into their
defects. The The ChemetriQ 3000 is highly manufacturing lines to improve the
ChemetriQ 3000 complementary to today's existing optical performance of their devices, process
accomplishes this by inspection technologies, filling the
quality becomes ever more critical to
employing an innovative, inspection gap that exists today for a full
device yields. This is especially true with
non contact, non destructive technology wafer, production solution that enables
wafer cleaning and surface preparation,
that detects work function variations on detection of NVDs.
which are the most repeated process steps
the surface of wafers. These variations, As the missing link in moving the
in the fab and among the most frequent
sources of yield loss.
which mark the presence of NVDs, are detection of NVDs to a highly automated
The introduction of new materials has
converted into image files using on board inline process, the ChemetriQ 3000
further narrowed the slim process
software that can be easily ported to a enables chipmakers to broaden and
margins associated with these processes,
fab's existing analytical tools for expand their existing solution set to solve
giving rise to NVDs.
enhanced defect classification. their NVD yield challenges. In leading edge semiconductor fabs,
The ChemetriQ 3000 is sensitive to NVDs now account for as much as 30
5E9 atoms/cm
2
(one atom out of
percent of all defects.
200,000 per square centimeter), which
Since NVDs do not scatter light, they
exceeds the requirements outlined in the
are undetectable by optical inspection
ITRS roadmap for metallic contamination
systems.
detection down to the 22nm node.
According to the latest edition of the
ITRS Roadmap, the rapid sourcing of non
Leveraging the ChemetriQ 3000,
visual defects will become increasingly
semiconductor manufacturers can reduce
challenging-driving the need for
their yield loss through improved process
affordable inspection techniques that
monitoring, and achieve faster yield
go beyond optical microscopy and offer
ramps through accelerated process high resolution without sacrificing
optimisation. throughput.
For example, the ChemetriQ 3000
The ChemetriQ 3000 platform is the
detects NVDs non destructively in four
only inline wafer inspection solution that
minutes compared to up to six hours with
can detect NVDs.
There may be stronger plasma energy sources …
… but certainly none that are as precise. HÜTTINGER generators can be accurately regulated. And therefore offer ideal solutions for plasma exci-
tation in industry and research. Whether for the production of semiconductors, flat panel displays, solar cells or for large area coatings. HÜTTINGER’s
DC, MF and RF generators impress through reliable technology and excellent availability – with simple system integration. High process stability
and rapid-reaction arc management – for optimum process results. HÜTTINGER is the world’s undisputed number one in generators for large
area coatings.
www.huettinger.com
www.euroasiasemiconductor.com July 2008
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