This page contains a Flash digital edition of a book.
IC Industry Awards Preview 2009
Additionally, the software component operator exposure to chemicals during version consists of a controller with
contains a new gas control algorithm installation and disposal. integrated PLC interface. This allows
designed to enhance gas management setting the speed by an external signal
for the system. and enables precise flow or pressure
Levitronix
control in connection with either a flow
BPS 600S maglev pumps
or a pressure sensor.
Entegris
Torrento: liquid filters
The BPS 600 magnetically levitated
Nexen
pump technology was designed for
Torrento is a family of high-flow liquid
demanding applications in the industry
Roller Pinion System
filters that help improve liquid
such as CMP slurry delivery, copper
contamination control of nano-scale
electroplating and wafer cleaning at
The Roller Pinion System (RPS) provides
particles in wet etch and clean (WEC)
leading-edge process nodes. The
zero backlash, very high positional
manufacturing processes used in
patented impeller floats in a magnetic
accuracy, unlimited length or diameters,
advanced semiconductor applications.
field only touching the fluid it is
very high speeds, 99% efficiency, high
Built on a combination of new
rigidity, low noise, low maintenance,
Issue IV 2009
pumping, and can be fully integrated
square4
membrane technology and an advanced
into a fully-closed loop electronic control
corrosion resistance, and long life. This
ATE device construction, the filters .com
system without the need of additional
opens up new design possibilities and
provide high-yield, rapid bath clean-up
controller hardware.
provides the capability to achieve higher
cycles, extended filter life, and allow for
levels of performance in designs.
fast change-outs and increased
cleanliness.
The BPS 600 is ideal for CMP slurry The RPS’s innovative meshing action
delivery because it eliminates shear provides zero backlash and positional
With the Torrento high-flux platform of stress and mechanical contact which accuracy up to ± 20 um [± 0.00079 in.]
WEC filters, manufacturers can maintain cause particle agglomeration. The in both directions by maintaining
oasiasemiconductor
ultra-high flow rates without sacrificing moderate shear level to which the slurry opposing contact with two or more
.eur
chemical purity at the 20nm rating. This is exposed in maglev pumps seems to teeth at all times. Each tooth profile is
www
is due to the Torrento’s 20nm filters have a beneficial effect on the slurry by precisely measured relative to the first
using a specialized non-de-wetting breaking apart loose agglomerates. In to ensure that high positional accuracy is
39
Teflon membrane technology that copper electroplating applications, the maintained and cumulative error is
attracts the contaminating particles solution cannot plate out and clog the eliminated. The RPS system can achieve
rather than just sieving them. Torrento pump. The closed loop electronic speeds, up to 11 m/sec (36.1 ft/sec),
filters also have a larger surface area control makes the BPS 600 ideal for that can normally only be obtained by
than general use filters due to an wafer cleaning. The pump can sense linear motors while providing high
advanced ATE device construction pressure and flow at the tool and adjust positional accuracy. Even at these
technology. The combined effect is a itself automatically. Continuous flow with speeds, the extremely low friction
filter that allows manufacturers to no pulsation generates repeatable design does not create heat or wear on
reduce particle-related wafer defects, cleaning conditions. components. The linear RPS system is
decrease process cycle time, and realize modular in design with 1-meter and 1/2-
20 percent longer filter life than its The BPS 600 can be used for CMP slurry meter segments that can be combined
closest competitor. The low filter delivery, copper electroplating and as needed to meet requirements.
resistance also is designed to reduce wafer cleaning applications. The
pump strokes and decrease wear and centrifugal pump has been designed
tear. with no bearings to wear out or seals to
Applications: The capability to maintain break down and fail. Based on the
flow rate at an extremely small pore size principles of magnetic levitation, the
in outgassing chemistries such as SPM, pump’s impeller is suspended, contact-
SC1 and SC2 ensures the stable free, inside a sealed casing and is driven
processing conditions needed for the by the magnetic field of the motor. The
high CpK results demanded at advanced impeller and casing are both fabricated
technology nodes. from chemical-resistant high purity
Platform: Torrento filters are available in fluorocarbon resins. Fluid flow rate and
cartridge and disposable formats to pressure are precisely controlled by
accommodate installation flexibility and electronically regulating the impeller
upgrades. The disposable filter speed. Two basic system configurations
eliminates operator handling of the filter are available: a ‘stand-alone’ Winner : Subsystem /Component
element, further minimizing configuration consists of a controller Provider Improvement Award 2008
contamination risk. The disposable with an integrated user panel to set the Carl Zeiss NTS GmbH
design also reduces the potential speed manually, while the ‘extended’ www.smt.zeiss.com/nts
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