IC Industry Awards Preview 2009
Subsystems & Components Award
DESCRIPTION
The tools required for semiconductor manufacturing are actualised as a
result of many companies providing innovative subsystems and
components to the tool manufacturers. These subsystems and
components can be a critical enabler for the success of a given tool.
COMPONENTS ENHANCEMENT AWARD
Not all improvements are from new developments and this Award
recognises the continuing development companies make to the products
Issue IV 2009
and processes they provide.
square4
.com
oasiasemiconductor
.eur
Advanced Energy
and pulse synchronization features offer increase tool predictability, and reduce
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Industries
the widest pulse-frequency range operating costs. AutoClean is a
Paramount RF-power
available, according to the company. complete system solution comprised of
37
The system is able to keep pace - in real a chemical reagent (xenon difluoride),
delivery system
time - with the most abrupt plasma- sub-atmospheric solid delivery system,
impedance changes, and therefore customer specific process recipes and
Advanced Energy Industries’ enables faster transitions, shorter extensive application support. This
Paramount RF-power delivery system process steps and reduced process combination has proven highly
platform is power-delivery accuracy and times. Optional frequency tuning is successful in tests and in real-world
control for increasingly complex film performed virtually instantaneously working conditions to effectively remove
stacks and fine feature sizes. The 3kW (within msec) dopant materials from inside implanters.
Paramount system is suited for both The half-rack, 3kW RF power supply’s The result is improved ion source life,
etch and deposition processes in impedance measurement is claimed to reduction in glitching, extended PM
semiconductor, FPD, MEMS and solar rival the accuracy of a network analyzer, cycles, increased tool availability, and an
photovoltaic manufacturing. enabling improved power delivery overall reduction in operating costs of
accuracy and control at 13.56 MHz fixed ion implanters.
Device fabrication processes feature or variable frequencies. It is claimed to
anti-reflective coatings, hard masks, cap have accuracy, repeatability and process The ATMI AutoClean solution is a safe
layers and stop layers in their recipes. control for 50 ohm and non-50 ohm and effective flow of a chemical reagent
Process designers must account for loads. into the source region says the
these layers and accurately etch or company. The reagent flows just like a
deposit the primary layer that may process dopant, yet requires no plasma
The IC Industry Awards
comprise multiple compositions and activation to produce a highly effective
will be presented at
doping profiles. The Paramount platform fluorinating agent to clean all contacted
SEMICON Europa 2009
has been engineered to accommodates surfaces in the source, even those not
these complexities with ultra-accurate contacted by plasma. Automated
power control and delivery across the
ATMI
recipes can be implemented to run the
full output range - both on and off 50 AutoClean process at regular intervals,
ohm - for seamless process transitions in
AutoClean ion implanter
or manually initiated for error recoveries
etch, strip, PECVD, HDP-CVD, PVD and and species changes. As a result, the
PEALD. Where pulsing is required to AutoClean from ATMI is a technology source region is cleaner and remains
enable next-generation process steps, which claims to extend ion implant cleaner longer, extending source life in
the Paramount system’s optional pulse source life by more than 40 percent, excess of 40%.
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