IC Industry Awards Preview 2009
and reducing system downtime. Cabot Microelectronics’ scientists
AR coated calcium fluoride prisms offer provide excellent low-K dielectric and
an alternative to flat turning mirrors. copper removal rate control, resulting in
Calcium fluoride is more robust than UV- superior electrical performance.
grade fused silica, and has been shown
to withstand billions of pulses without The B6600 barrier slurry products are
serious compaction issues. Al2O3/AlF3 being produced and used worldwide for
or LaF3/MgF2 or similar thin-film anti- technology nodes from 90 nm through
reflection coatings on the prisms have 45 nm.
very low layer counts that allow very
little compaction in the coating layer.
By limiting the number of layers and
mitigating compaction issues, the
effective bandwidth of the thin film
coating can be expanded to allow
a much wider acceptance angle at the
Swagelok
entrance and exit faces, improving the
performance of the optical system.
CR-288 Chemical
Recognising
Concentration Monitor Innovation
The IC Industry Awards
will be presented at
SEMICON Europa 2009
The Swagelok CR-288 concentration
monitor allows for improved monitoring
Rewarding
and control of liquid chemicals
employed in device manufacturing.
Motivation
Cabot Microelectronics
Installed in the process stream or at
Corporation point-of-use where chemicals are
B6600 Series of CMP Slurries
delivered or blended, the technology
20
delivers real-time, highly accurate
for Low K Devices
www
measurements of the concentration and
IC Industry
The B6600 barrier slurry platform builds temperature of process fluids.
.eur on Cabot Microelectronics’ CMP slurry The CR-288 is claimed to be the first
oasiasemiconductor
technology and is the result of extensive compact device in the industry to
Awards
research and development intended to provide in-line analysis of liquid
deliver an integrated, best-in-class chemical concentration. 2009
solution for copper barrier CMP at
advanced technology nodes. It is physically small, easy to install, and
serviceable in the field. Proprietary
.com
The B6600 barrier slurry platform is software enables technicians to calibrate
tunable, enabling the products to be the unit for chemical mixtures used in
easily customised to deliver excellent semiconductor laboratory or
square4
Issue IV 2009
planarity and defect performance across manufacturing processes, including
a wide range of integration schemes. etching, wafer cleaning, and chemical
Technology advancements made by mechanical planarization (CMP).
The software provides a graphical
readout that the technician may
customise for data logging over time.
With the ability to monitor up to four
separate fluid streams with one digital
display unit, the device can help the
microelectronics industry reduce
chemical consumption, improve process
control and visibility, detect process
problems, reduce wafer scrap, and
improve productivity. In addition, it will
Winner: Materials Enabling 2008
Winner 2008
Advanced Diamond T
echnologies Inc
echnologies, Inc.
facilitate point-of-use spiking, blending,
www.thindiamond.com
and mixing and help ensure chemical
and ultrapure water quality.
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