IC INDUSTRY AWARDS WINNER 2008
7
Award: Yield Management - Best Process
Company: FEI Company
Process: Helios NanoLab 400S
Website: www.fei.com
Helios NanoLab 400S
The Helios NanoLab series is an advanced environmental fields. Constant power lens
DualBeam platform for sample preparation, technology eliminates thermal instabilities
imaging and analysis in semiconductor failure caused by routine changes in lens power.
analysis, process development and process
control laboratories. All Helios NanoLab Sidewinder Ion Column
systems combine the Elstar electron column for The Sidewinder ion column combines high-
high-resolution, high-contrast imaging with the resolution with exceptional low voltage
high-performance Sidewinder ion column for performance. Not only does it enable excellent
fast, precise cross sectioning. The advanced ion image resolution (5 nm @ 30 kV,
system design optimises the column coincident WD), it also provides the most
configuration to provide the best combined precise ion milling, helping to insure that
performance available in any dual beam valuable defect information is not destroyed by
(FIB/SEM) system. the cross sectioning operation. A full range of
beam chemistry options supports accelerated
The Helios NanoLab 400S is optimised for high milling, selective milling, deposition and
throughput, high-resolution S/TEM sample enhanced imaging with both ion and electron
preparation, imaging and analysis. Its beams.
FlipStage and in-situ STEM detector can flip
from sample preparation to STEM imaging in Integrated Preparation, Imaging and Analysis
seconds without breaking vacuum or exposing The Helios NanoLab 400S is a platform for
the sample to the environment. S/TEM sample preparation and imaging. The
in-situ STEM detector permits real time
The FilpStage mounts on a five-axis motorized monitoring of the STEM image while thinning,
stage that accommodates samples up to 80 mm for ultimate control of the preparation process
in diameter with full coverage and industry- and localization. The Sidewinder ion column's
leading repeatability. Samples up to 100 mm ability to maintain small beam diameter at less
can be introduced through the load lock for than 1 kV enables low-energy, grazing-
optimal throughput. Larger samples may be incidence final clean-up to remove surface
introduced through the chamber door. damage induced by higher-energy milling. The
400S provides STEM capability at accelerating
Elstar Electron Column voltages up to 30 kV, or the sample may be
The Elstar electron column, newly introduced in transferred to a high voltage S/TEM for ultra
the Helios NanoLab series, provides the high resolution imaging and analysis.
foundation of the systems' unprecedented high- Extensive automation permits unattended
resolution imaging capability. Helios NanoLab preparation of multiple site-specific S/TEM
systems are capable of 0.8 nm STEM samples in a single session at a cost-per-sample
resolution. SEM resolution is equally competitive with conventional SEM bulk
impressive with 0.9 nm at optimal working sample preparations. Optional X-ray (EDS or
distance and 1.0 nm at the DualBeam WDS) spectrometers offer compositional
coincident point. Imaging performance is analysis in thin samples with resolution down to
further enhanced by advanced scanning and 30 nm. Automated slice and view capability can
through-the-lens signal detection systems that acquire a sequence of cross sectional images
provide dramatic improvements in contrast and and reconstruct a three-dimensional model of
signal-to-noise ratio. Double magnetic shielding the cross-sectioned volume that can be viewed
increases the systems' immunity to and virtually re-sectioned in any direction.
IC Industry Award Winners 2008 www.euroasiasemiconductor.com
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