IC INDUSTRY AWARDS WINNER 2008
13
Award: Sub System/Component Provider - Improvement
Company: Carl Zeiss NTS GmbH
Tool: Libra 200: Field Emission Gun (FEG) Energy Filtered
Website: www.smt.zeiss.com/nts
Libra 200 MC
T
he Libra 200MC is a Transmission are greatly improved.
Electron Microscope (EFTEM) ● Improved energy resolution allows to
from the Carl Zeiss company determine the band gap variations throughout a
which is an energy filtered field emission gun layer. This is very important in porous materials
(FEG). Electrons generated in the FEG are like low k materials or materials with a
accelerated to 200 kV and interact with the composition gradient like some of the gate
sample atoms in several ways while crossing it. oxides.
This allows observation of critical samples at ● Improved energy resolution enables chemical
an atomic level structure. As manufacturing and structural composition, by giving access to
moves to near angstom level such tools will be details of the near edge structure.
required for manufacturers to maintain This is important for interfacial layers, like
appropriate control over their processes. gate oxide interfaces, which critically influence
the electrical properties of the device.
After a sample the transmitted electrons are
analysed. The EFTEM allows imaging down to ● Reduced energy spread contributes to extend
the Angstrom scale and spatially resolved the information limit which improves the
chemical and crystallographic analysis, so it is capability of the instrument to deliver highly
necessary in all important sectors of spatially resolved images.
semiconductor industry:
● R&D: characterisation of new materials
(high k, low k) and imaging of the most
advanced devices
● Engineering: device shape and dimensions
optimisation (gate oxides, gate shape, spacers,
via etch).
● Production and reliability: Physical failure
analysis (root cause determination by imaging
and chemical analysis), electromigration in
back end metal lines. EFTEM applications
often require the analysis of the spectrum of
the energy lost by the electrons while passing
trough the sample. The measurement accuracy
is affected by the energy spread of the primary
beam electrons, which is about 0.7 eV.
The monochromator (MC) reduces this spread
by a factor of 7 to values around 0.1 eV.
Therefore the capabilities of the instruments
IC Industry Award Winners 2008 www.euroasiasemiconductor.com
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