FILTRATION
23
Creating superior processing
environments
Thanks to in depth understanding of the chemistry
of HMDS breakdown in cleanroom conditions, and
thanks to efficiency testing of layered media
combinations, Donaldson shows that BSMmax
technology provides a solution for cleaner air and
more productive work environments. With patents
on our V-bed technology, our exclusive BSMmax
technology removes both ammonia and siloxanes
that can lead to lens hazing. Acid gas filtration
and the effective removal of SO
2
at low challenge
concentrations has already been addressed in SPIE
papers 2005.
4,5
Available for Donaldson’s Lithoguard chemical
filtration cabinets, point of use filters and filter life. Along with longer filter life and lower Figure 4:
replacement filters for other manufacturers’ maintenance, BSMmax filter inserts are refillable Breakthrough curves
cabinets, BSMmax filters provide tangible benefits which substantially lowers the cost of ownership with HMDS at 50%
of ownership: maximum protection and longer and offers environmental benefits. humidity using layers
of base impregnated
and acid
impregnated
activated carbon
AUTHOR: 3 Protasova L V; Grinberg E E; Bessarabov A
Kevin Seguin, Andrew Dallas and Gerald Weineck, M; Makarov V V; Polyanskii M A The
Donaldson Company, Inc mechanism and kinetics of the synthesis of
hexamethyldisiloxane. 1991, Russian journal of
physical chemistry, 65 (2) 283-28
REFERENCES:
1 Grayfer, Anatoly; Belanger, Frank V.; Cate, 4 Gronheid, Roel, Lithography Department,
Phillip; Ruede, David, Gas IMEC; Al-Horr, Rida, Dionex Corporation,
Microcontamination Business Unit, Entegris, Inline monitoring of acid and base contaminants
Inc., New Filter media development for at low ppt-levels for 193nm lithography, SPIE,
effective control of trimethylsilanol (TMS) and 2005.
related low molecular weight silicon
containing organic species in the photobay 5 Dallas, Andrew J.; Ding, Lefei; Exley, Jeremy;
ambient, Metrology, Inspection, and Process Joriman, Jon; Zastera, Dustin, Corporate
Control for Microlithography XXI, Proc. of Technology, Donaldson Company Inc.; Joang,
SPIE Vol. 6518 651842-1, 2007. Brian; Parsons, Jonathan; Seguin, Kevin, High
Purity Products, Donaldson Company Inc.,
2 Matsumoto, Y; Miyaji, A; U.S. Patent Removal of low concentrations of acid gases:
5,430,303 Exposure Apparatus; July 4, 1995. issues and solutions, SPIE, 2005.
September 2008
www.euroasiasemiconductor.com
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