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Financial boost for e-beam
MAPPER Lithography has announced University of Technology, which are not
that it has been awarded a subsidy of just suppliers but also shareholders in
around EUR 10million by SenterNovem, the company. Each of these businesses
the innovation agency of the Ministry of provides its own contribution to the
Economic Affairs. The subsidy is development of the tool in the fields of
provided as part of the High Tech Top MEMS, high speed data processing,
Projects scheme. Mapper and its optical data transmission, optics,
partners will use these funds to develop mechatronics and motion control.
the beta tool, which will demonstrate With the subsidy, the Netherlands will
that the lithography machines are reinforce its position in e-beam
suitable for production in high volumes. lithography compared to competitors. companies in high tech industries to
MAPPER Lithography will develop Jaap Bastiaansen, Chief Financial continue to invest in their future via
the beta tool with Catena, Technolution, Officer (CFO) of Mapper Lithography, strategic R&D projects despite the
Multin Hittech, Demcon and Delft comments: “We are very pleased with crisis. The objective is to further
the award of this subsidy. It will enable strengthen the internationally leading
us to, in addition to constructing position of the Netherlands in these
ASML
machines, continue to undertake the fields, to ensure the Dutch economy is
research activities required for the strongly positioned for the future.
announces
optimisation of the next generation of MAPPER develops lithography
our machines in line with our roadmap. machines for the semiconductor
new COO
We carry out these activities in industry. These machines utilise new
association with the best technology and innovative technology enabling the
companies in the Netherlands. The fact chips of the future to be produced cost-
ASML has announced that the that leading parties including TSMC and effectively. Via maskless electron
Supervisory Board intends to appoint Leti are currently testing our first lithography, over 10,000 parallel
8
Frederic Schneider-Maunoury as machines attests to the growing electron beams are used to write
Executive Vice President and Chief confidence of the market in our patterns of electrical circuits directly on
www
Operating Officer (COO) to the Board maskless lithography technology.” to wafers, eliminating the expensive
.eur of Management, subject to Under the High Tech Top Projects photo masks used in current lithography
oasiasemiconductor
notification of the general meeting of scheme, the Ministry of Economic machines. Current lithography machines
shareholders which is scheduled to be Affairs is providing subsidies totalling use photographic techniques to create
held on March 24, 2010. EUR 100 million for five strategic R&D extremely small electrical circuits, with a
Mr. Schneider-Maunoury (47) is projects. The development of the beta surface area of less than 1/100th of a
currently Vice President Thermal tool by Mapper is one of those projects. human hair, on silicon wafers. They use
Products Manufacturing at French Subsidies have also been granted to a very expensive mask that contains the
.com
industrial and transport equipment ASML, NXP, Philips and Océ. blueprint of the chip to transfer this
group Alstom. He will join ASML on By supporting High Tech Top pattern on to a photosensitive layer
January 1st, 2010. Projects, Minister Maria van der Hoeven (comparable to a photograph being
square4
Issue VII 2009
Mr. Schneider-Maunoury is a of Economic Affairs aims to help exposed on film).
graduate of Ecole Polytechnique and
Ecole Nationale Supérieure des
Mines. He held various positions at
the French Ministry of Trade and Material agreement
Industry before he joined Alstom.
“We are delighted to welcome HALOCARBON PRODUCTS Halocarbon CEO Peter Murin.
Frederic to ASML and we are CORPORATION has entered into “With this agreement , we can
confident his worldwide business and a licensing agreement with IBM to partner our fluorochemicals
operational experience in high-value access IBM’s industry-leading development and manufacturing
equipment will be of great value as portfolio of patents related to expertise with IBM’s leadership in
ASML gears up to reinforce its global hexafluoroisopropanol-based developing advanced electronic
leadership position with new photoresists for semiconductor materials such as photoresists.”
generations of semiconductor manufacturing. “This agreement will allow us to
lithography systems,” said Eric “Halocarbon has long produced leverage our HFIP business and provide
Meurice, president and CEO of hexafluoroisopropanol (HFIP) as a key reliable, regular, cost–effective, US-
ASML. component in the manufacture of the based production of advanced
anesthetic sevoflurane,” said photoresist compounds,” added Murin.
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