IC Industry Awards Winners
Award Wafer Processing - FEOL
System NSR-S310F
Company Nikon Corporation
NSR-S310F
The NSR-S310F is an advanced ArF
scanner for high volume
manufacturing of 65 nm or smaller
devices. The system uses Nikon
Tandem Stage technology to increase
throughput, improve alignment
accuracy, and enhance long-term
stability. With the throughput increased
to 174 wafers per hour – a 20% increase
32
over the previous generation Nikon
scanner – cost of ownership is significantly
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reduced. The Tandem Stage also helps
.eur improve alignment accuracy to better
oasiasemiconductor
than 7 nm.
The projection optics (0.92 NA) and
illumination system provide superior image
quality and CD control across the wafer with the
low aberration and flare levels. Nikon’s fourth
generation polarization control system,
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POLANO, and optional infrared aberration
control (IAC) provide further imaging
benefits.
square4
Issue VII 2009
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