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Flexible. Maskless.
Answer to all problems?
Conventional photolithography normally requires a physical mask.
The disadvantage of such systems could be the materials required. This article
looks at flexible maskless photolithography for electronic devices by rapid
prototyping. By Prabhat K. Dwivedi and Ashutosh Sharma of DST unit on
Nanosciences, Department of Chemical Engineering, Indian Institute of
Technology and Jay Sasserath and David Fries of Intelligent Micro Patterning
discuss how maskless lithography can provide solutions
A MASKLESS photolithography system produce these images in real time. elements, which are used to produce the
will be described that provides the pattern.
capability for rapid prototyping of micro Figure 1 shows a schematic of the SF-100
sized structures for microfludics, ELITE. Designs are drawn using A mercury arc lamp is the source of optical
optoelectronics, electronic and photonic conventional engineering design or drawing energy for the SF-100. Since g-line (435
applications on different substrates using programs. These designs are then nm), h-line (405 nm), and i-line (365 nm)
various kinds of photoresists. The system is transferred to the SF-100 host computer for energies are transmitted to the substrate
useful for research purposes in terms of use on the system. The SF100 computer is a surface, many standard optical materials are
simple, cost effective and fast processing. standard personal computer that provides compatible with the SF-100. Light energy
dual video output, one to the computer passes from the lamp to the Smart Filter
Maskless lithography system monitor and the other to the Smart Filter subassembly through a variety of optical
The SF-100 ELITE is a simple, easy to use subassembly. The Smart Filter then components needed to provide collimated
micro patterning system. Through its unique modulates the appropriate MOEM and uniform energy over the entire exposure
patented design, the system allows user to
fabricate micro devices quickly, easily and
cost effectively.
Smart Filter Technology provides the means
for easy and efficient optical processing
utilizing the SF-100. This technique utilises
reflective micro opto electro mechanical
(MOEM) elements to spatially modulate
light such that light can be controlled on the
several micron sized regime, simultaneously
over a 16mm x11mm field of view. These
individual exposures can be stitched
together to form a single, large area pattern.
Each SF-100 system includes a Smart Filter
subassembly that incorporates all of the
hardware and control software needed to Figure 1-A schematic representation of an SF-100 ELITE Maskless Lithography System
Summer 2008 | www.semiconductor-india.com 37
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