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MicroNanoSystems
pioneer users. On the other hand, if ITO is ever been demonstrated to improve the quality of
The vacuum
replaced in a significant way, nanomaterials are sputtered films without the high substrate
the best bet. Despite the recession, there has temperatures associated with ordinary curing. If
deposition
been a lot of (mostly) encouraging activity in this they can be extrapolated to also improve the
space since NanoMarkets’ last report, with quality of ITO films deposited by printing, laser
methods by
Cambrios in particular leaving its former under- annealing may provide a route for increased use
the-radar image behind it in the past year, a year of printing in many ITO applications.
which ITO
that saw demonstrations of conductive The second area of opportunity is the
nanomaterials for e-paper and LCD backplanes. further development of electrostatic spray
is usually
NanoMarkets believes that a significant assisted vapour deposition (ESAVD). ESAVD
commercial launch of a display with a requires high temperatures like many of the
applied are
Issue V 2009
nanomaterials based backplane may be soon. standard techniques of depositing ITO, but it
square4
While the interest of the makers of organic and offers the potential for open atmosphere
inherently .com
TCO replacements for ITO is largely in selling an processing, potentially leading to the elimination
existing product, the motivation for the makers of costly sputtering equipment.
inefficient
of nanomaterials is almost the opposite. Any analysis of new manufacturing methods
Often the firms that one finds in this area for ITO must consider the prospects for printed
processes
are firms that see ITO substitutes as a stepping ITO. ITO inks have been around for a while, but
off point for other opportunities. ITO substitutes have had a niche status. There seem to be few
in terms of
represent a relatively easy market to break into, firms really throwing themselves into this area,
oasiasemiconductor
although this has not yet occurred. so NanoMarkets does not expect huge revenues
material
.eur
to emerge from the printed ITO sector.
Manufacturing improvements
www
If printed ITO can demonstrate performance
usage
New methods for applying ITO have been matching that of sputtered ITO, then we can
27
proposed and tried, but they do not match the expect to see a shift in this direction over time.
performance achieved through sputtering ITO. High performing, printed ITO would appeal even
Nonetheless, manufacturing improvements still to the high end applications. By using such
present an opportunity to achieve cost material, displays could maintain their high visual
reductions. This opportunity obviously brings clarity while simultaneously saving money on two
value to new manufacturing approaches and the fronts. The cost of ITO could be reduced by as
associated materials and equipment. The much as 70 percent due to elimination of the
vacuum deposition methods by which ITO is waste from sputtering; and processing could
usually applied are inherently inefficient move toward inexpensive, continuous roll-to-roll
processes in terms of material usage. Typically, printing processes.
less than 30 percent of a sputtering target gets
applied to a substrate; much of the rest is Materials developments
applied to chamber walls. Plus, the vacuum In order for ITO to hold onto its dominant
deposition equipment is costly and expensive to position in the transparent conductor industry,
maintain. Finally, most sputtering processes changes will be required. One direction in the
require high substrate temperatures, making materials development is to mix ITO with other
them unsuitable for temperature-sensitive materials. For example, Sigma Technologies
substrates, such as plastics. offers an ink combining ITO and silver
Alternative methods of applying ITO seek to nanoflakes with a conductive polymer binder,
improve on one or more of these problems, and which is claimed to be more conductive than
because there is something of a pent up conventional nanosilver. Other developments
demand for this kind of technology, successful could include: indium oxide and indium zinc
approaches can expect to start earning revenues oxide (actually Zn-doped indium oxide). The
fairly fast. New ITO manufacturing technology attraction of indium zinc oxide (IZO) is that it has
has the potential to allow manufacturers to better etch characteristics than
continue using ITO, reducing the need for risk crystalline ITO and that it has
taking at the materials level. Two areas have a lower resistivity than ITO.
potential in the next few years. It can also be deposited
The first area is the further development of on unheated substrates.
laser annealing methods. These methods have Two other approaches
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